Wetprocess

Process equipment for heated DI water and
chemical supply, including chemical pumps, PFA
fittings and process baths or wet etch equipment.

Refine
Category
Height
326 mm
Width
283 mm
Depth
326 mm
Material
NPP
PTFE
Wafer size
Up to 6" (150 mm)
Up to 6" (150mm)
Up to 8" (200mm)
Substrate size
NPP
PTFE
Up to 4" x 4" (100 mm)
Type
Desktop version
In-Deck Version
Drive unit
Up to 12.000 RPM
Acceleration/Deceleration
1-30.000 RPM
Programs
CCW rotation and puddle option
CW

SPIN150i-200i In-Deck

5products
Order by
Filter
wetprocess
42022
SPIN150i-200i In-Deck
POLOS
SPIN200i-NPP-INT Single Substrate Spin Processor
Up to 8" (200mm)
NPP
In-Deck Version
wetprocess
42023
SPIN150i-200i In-Deck
POLOS
SPIN200i-PTFE-INT Single Substrate Spin Processor
Up to 8" (200mm)
PTFE
In-Deck Version
wetprocess
42025
SPIN150i-200i In-Deck
POLOS
SPIN150i-NPP-INT Single Substrate Spin Processor
Up to 6" (150mm)
NPP
In-Deck Version
wetprocess
42026
SPIN150i-200i In-Deck
POLOS
SPIN150i-PTFE-INT Single Substrate Spin Processor
Up to 6" (150mm)
PTFE
In-Deck Version
wetprocess
SPIN150X-INT
SPIN150i-200i In-Deck
POLOS
SPIN150x Spin coater POLOS®
Up to 6" (150 mm)
Up to 4" x 4" (100 mm)
Desktop version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
2 Sizes:
SPIN150x Spin coater POLOS® NPPSPIN150x Spin coater POLOS® PTFE