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SPIN150x-200x
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Options POLOS
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Height
326 mm
Width
283 mm
Depth
326 mm
Material
NPP
PTFE
Wafer size
Up to 6" (150 mm)
Up to 8" (200 mm)
Substrate size
Up to 4" x 4" (100 mm)
Up to 6" x 6" (150 mm)
Type
Desktop version
Drive unit
Up to 12.000 RPM
Acceleration/Deceleration
1-30.000 RPM
Programs
CCW rotation and puddle option
CW

SPIN150x-200x

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photolithography
SPIN150x Spin coater POLOS®
SPIN150X
SPIN150x-200x
POLOS
SPIN150x Spin coater POLOS®
Up to 6" (150 mm)
Up to 4" x 4" (100 mm)
Desktop version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
View product
2 Sizes:
SPIN150x Spin coater POLOS® NPPSPIN150x Spin coater POLOS® PTFE
photolithography
SPIN200x Spin coater POLOS®
SPIN200X
SPIN150x-200x
POLOS
SPIN200x Spin coater POLOS®
Up to 8" (200 mm)
For up to 6" x 6" (150 mm)
Desktop Version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW Rotation and Puddle option
View product
2 Sizes:
SPIN200x Spin coater POLOS® NPPSPIN200x Spin coater POLOS® PTFE