Photolithography

Products for safe storage and handling of reticles,
as well as mask aligners and uv meters.

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SPIN150i-200i
(1)
POLOS-200
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(3)
Options POLOS
(14)
Chuck
(11)
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(5)
Chuck Foil
(2)
Height
326 mm
Width
283 mm
Depth
326 mm
Material
NPP
PTFE
Wafer size
Up to 6" (150 mm)
Substrate size
Up to 4" x 4" (100 mm)
Type
Desktop version
Drive unit
Up to 12.000 RPM
Acceleration/Deceleration
1-30.000 RPM
Programs
CCW rotation and puddle option
CW

SPIN150i-200i

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photolithography
SPIN150x Spin coater POLOS®
SPIN150X
SPIN150i-200i
POLOS
SPIN150x Spin coater POLOS®
Up to 6" (150 mm)
Up to 4" x 4" (100 mm)
Desktop version
Up to 12.000 RPM
1-30.000 RPM
CW, CCW rotation and puddle option
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2 Sizes:
SPIN150x Spin coater POLOS® NPPSPIN150x Spin coater POLOS® PTFE