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Material
NPP
Wafer size
12" (300 mm)
Substrate size
up to 450 mm diameter
Type
Stand alone version
Programs
CCW Rotation and Puddle option
CW

POLOS-450

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photolithography
44399
POLOS-450
POLOS
POLOS450-NPP Advanced PP Spin Processor
12" (300 mm)
up to 450 mm diameter
Stand alone version
CW, CCW Rotation and Puddle option