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POLOS-450
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Category
SPIN150x-200x
(5)SPIN200x Advanced
(1)SPIN300x Advanced
(1)POLOS-450
(1)Spray Coating
(4)SPIN4000A-5000A
(3)Options POLOS
(14)Chuck
(11)Chuck Adapter
(5)Chuck Foil
(2)Material
NPP
Wafer size
12" (300 mm)
Substrate size
up to 450 mm diameter
Type
Stand alone version
Programs
CCW Rotation and Puddle option
CW
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photolithography
44399
POLOS-450
POLOS
12" (300 mm)
up to 450 mm diameter
Stand alone version
CW, CCW Rotation and Puddle option