Photolithography

Products for safe storage and handling of reticles,
as well as mask aligners and uv meters.

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Material
NPP
PTFE
Wafer size
6" (150 mm)
Substrate size
6” x 6” square
Substrate size 6” x 6” square
Type
Desktop Version
In Deck
Drive unit
Up to 12.000 RPM
Acceleration/Deceleration
1-30.000 RPM
Programs
CW & CCW puddle rotation options

POLOS-200

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photolithography
42839
POLOS-200
POLOS
Polos 200 Advanced NPP
6" (150 mm)
6” x 6” square
Desktop Version
Up to 12.000 RPM
1-30.000 RPM
CW & CCW puddle rotation options
photolithography
42840
POLOS-200
POLOS
Polos 200 Advanced PTFE
6" (150 mm)
Substrate size 6” x 6” square
In Deck
Up to 12.000 RPM
1-30.000 RPM
CW & CCW puddle rotation options