POLOS

SPIN200x Standard - Spin coater POLOS® - Integrator Model PTFE

POLOS

SPIN200x Standard - Spin coater POLOS® - Integrator Model PTFE

Choose your size:

SPIN200x-INT Single Substrate Spin Processor
Type: In-Deck Version

The POLOS SPIN200x is a versatile and high-quality substrate spin coater, made out of PTFE. It is specifically designed for R&D and low volume production. The In-Deck Version is suitable for easy integration in your existing or new wetbench.

Suitable for Coating, Cleaning, Rinse/Dry, Developing, Etching, PDMI, and other processes

Specifications:

  • For up to 8" (200 mm) Wafers
  • For up to 6" x 6" (150 mm) Substrates
  • Material: PTFE
  • 12.000 RPM (Depending on Substrate / Chuck)
  • High Acceleration and Accuracy
  • Manual Chemical Dispense
  • Central dispensing syringe holder with integrated N2 diffuser
  • CW& CCW Rotation
  • Colour Touchscreen with Customisable Icons
  • USB Port
  • 20 kg


Including

  • 1 x A-V87-S96-PP-HD - Vacuum Chuck


For more information visit:
SPS-polos.com

Options

Photolithography
37596
Options POLOS
POLOS
Centering Aid (F-S-SPIN200x)
Photolithography
SHSK
Options POLOS
POLOS
Syringe Holder Starter Kit
Photolithography
POLOS Vacuum Pump
Options POLOS
POLOS
Vacuum Pump (Oil-less)
Photolithography
29243
Options POLOS
POLOS
Drain Hose (DEXT-NPP1.5)