The POLOS SPIN200i is a versatile and high-quality substrate spin coater. It is specifically designed for R&D and low volume production. An aerodynamically efficient chamber enhances uniformity, while the natural polypropylene or PTFE construction ensures a metal-free, contamination-free process area that is easy to clean. Desktop Version for manual or automated (optional) chemical dispense.

Suitable for Coating, Cleaning, Rinse/Dry, Developing, Etching, PDMI, and other processes

Specifications:

• Up to 8" (200 mm) Wafers
• Up to 6" x 6" (150 mm) square Substrates
• Material: PTFE
• Easy, step- by- step recipe programming via large colour touchscreen
• Transparent Lid with syringe holder for central dispensing
• Electro-magnetic safety lid lock
• N2 diffuser for N2 purge during process
• 12.000 RPM (Depending on Substrate / Chuck)
• High Acceleration and Accuracy
• Manual Chemical Dispense
• CW & CCW Rotation
• (Detachable) Colour Touchscreen with Customisable Icons
• Unlimited Program Storage for recipes with multiple steps each
• USB Port

Including

• 1 x A-V87-S96-PTFE-HD Vacuum Chuck
• 1 x D-V10-S50-PTFE-HD Fragment Adapter

For more information visit:
www.sps-polos.com