POLOS

SPIN200i-PTFE-INT Single Substrate Spin Processor

POLOS

SPIN200i-PTFE-INT Single Substrate Spin Processor

The POLOS SPIN200i is a versatile and high-quality substrate spin coater. It is specifically designed for R&D and low volume production. An aerodynamically efficient chamber enhances uniformity, while the natural polypropylene or PTFE construction ensures a metal-free, contamination-free process area that is easy to clean. This In-Deck Version is suitable for easy integration in your existing or new wetbench.

Suitable for Coating, Cleaning, Rinse/Dry, Developing, Etching, PDMI, and other processes

Specifications:

  • Up to 8" (200 mm) Wafers
  • Up to 6" x 6" (150 mm) square Substrates
  • Material: PTFE Easy, step- by- step recipe programming via large colour touchscreen
  • Transparent Lid with syringe holder for central dispensing
  • Electro-magnetic safety lid lock
  • N2 diffuser for N2 purge during process
  • 12.000 RPM (Depending on Substrate / Chuck)
  • High Acceleration and Accuracy
  • Manual Chemical Dispense
  • CW & CCW Rotation (Detachable) Colour Touchscreen with Customisable Icons
  • Unlimited Program Storage for recipes with multiple steps each
  • USB Port

Including

  • 1 x A-V87-S96-PTFE-HD Vacuum Chuck
  • 1 x D-V10-S50-PTFE-HD Fragment Adapter


For more information visit:
www.sps-polos.com