The POLOS SPIN200i is a versatile and high-quality substrate spin coater. It is specifically designed for R&D and low volume production. An aerodynamically efficient chamber enhances uniformity, while the natural polypropylene or PTFE construction ensures a metal-free, contamination-free process area that is easy to clean. Desktop version for manual or automated (optional) chemical dispense.
Suitable for Coating, Cleaning, Rinse/Dry, Developing, Etching, PDMI, and other processes
Specifications:
- Up to 8" (200mm) Wafers
- Up to 6" x 6" (150mm) square Substrates
- Material: Natural Polypropylene (NPP)
- Easy, step- by- step recipe programming via large color touchscreen
- Transparent Lid with syringe holder for central dispensing
- Electro-magnetic safety lid lock
- N2 diffuser for N2 purge during process
- 12.000 RPM (Depending on Substrate / Chuck)
- High Acceleration and Accuracy
- Manual Chemical Dispense
- CW & CCW Rotation
- (Detachable) Color Touchscreen with Customizable Icons
- Unlimited Program Storage for recipes with multiple steps each
- USB Port
Including
- 1 x A-V87-S96-NPP-HD Vacuum Chuck
- 1 x D-V10-S50-NPP-HD Fragment Adapter