SPIN200x Spin coater In-Deck POLOS®

SPIN200x-INT Single Substrate Spin Processor

Type: In-Deck Version

The POLOS Spin200x is a versatile and high-quality substrate spin coater, made out of PTFE or NPP. It is specifically designed for R&Dand low volume production. The In-Deck Version is suitable for easy integration in your existing or new wetbench.

Suitable for Coating, Cleaning, Rinse/Dry, Developing, Etching, PDMI, and other processes

Specifications:

• For up to 8" (200mm) Wafers
• For up to 6" x 6" (150mm) Substrates
• Material: Natural Polypropylene (NPP) or PTFE
• 12.000 RPM (Depending on Substrate / Chuck)
• High Acceleration and Accuracy
• Manual Chemical Dispense
• Central dispensing syringe holder with integrated N2 diffuser
• CW& CCW Rotation
• Colour Touchscreen with Customisable Icons
• USB Port
• 20 kg

Including

• 1 x A-V87-S96-PP-HD - Vacuum Chuck

For more information visit:
SPS-polos.com