SPIN200x Spin coater In-Deck POLOS®


SPIN200x Spin coater In-Deck POLOS®

Choose your size:
Liquid filter trap
Unique outer shell and drain design to switch between tabletop and indeck model in-field
Center injection holder for syringe or dispense nozzle - Lid lock and vacuum sensor for user safety 

SPIN200x-INT Single Substrate Spin Processor

Type: In-Deck Version

The POLOS Spin200x is a versatile and high-quality substrate spin coater, made out of PTFE or NPP. It is specifically designed for R&Dand low volume production. The In-Deck Version is suitable for easy integration in your existing or new wetbench.

Suitable for Coating, Cleaning, Rinse/Dry, Developing, Etching, PDMI, and other processes


  • For up to 8" (200mm) Wafers
  • For up to 6" x 6" (150mm) Substrates
  • Material: Natural Polypropylene (NPP) or PTFE
  • 12.000 RPM (Depending on Substrate / Chuck)
  • High Acceleration and Accuracy
  • Manual Chemical Dispense
  • Central dispensing syringe holder with integrated N2 diffuser
  • CW& CCW Rotation
  • Colour Touchscreen with Customisable Icons
  • USB Port
  • 20 kg


  • 1 x A-V87-S96-PP-HD - Vacuum Chuck

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