POLOS

SPIN150x Spin coater In-Deck POLOS® PTFE

POLOS

SPIN150x Spin coater In-Deck POLOS® PTFE

Choose your size:
Liquid filter trap
Unique outer shell and drain design to switch between tabletop and indeck model in-field
Center injection holder for syringe or dispense nozzle - Lid lock and vacuum sensor for user safety 

OUR NEW POLOS® SPIN150X WILL BE AVAILABLE BEGINNING OF JULY 2024

You can now order our new improved and innovative designed POLOS® SPIN150X model. It is a versatile and high-quality substrate spin coater, made out of PTFE. It is specifically designed for R&D and low volume production. It is a desktop version for manual or automated (optional) chemical dispense. 

Unique new design
The new unique outer shell and drain design allow you to switch between tabletop and indeck model in-field, in addition the unit is designed to be upgraded in-field using a wide range of different accessories to ease dispensing and overall handling.

Liquid filter trap
The Spin X Series is equipped with a Liquid Filter Trap to protect the critical components of our spin coaters, such as the drive unit, Vacuum Valve, Vacuum Sensor and ServoBL Controller. The Liquid Filter Trap will capture any liquids entering the vacuum lines via the process chamber or vacuum chuck. Any resists or fluids will be safely kept in a liquid jar/bottle, which can be viewed through a cut-out in the spinner housing. We recommend that all our customers check the liquid jar/bottle during their maintenance schedule and empty the bottle in case any liquids are present.

The spin coater is suitable for:

  • Coating
  • Cleaning
  • Rinse/Dry
  • Developing
  • Etching
  • PDMI and other processes.

Specifications hardware SPIN150X: 

  • Liquid filter trap 
  • Unique outer shell and drain design to switch between tabletop and indeck model in-field 
  • Center injection holder for syringe or dispense nozzle - lid lock and vacuum sensor for user safety 
  • Large (detachable) touchscreen display 
  • USB port to store recipes on USB drive and for software updates specifications
  • Drive-Unit: Indirect brushless drive unit - up to 12.000 RPM (depending on substrate / chuck) 
  • High acceleration and accuracy 
  • Acceleration/deceleration 1-30.000 RPM 
  • CW, CCW rotation and puddle option 


Complimentary Spin Coater Chuck and Adapter: 

  • 1 x A-V36-S45-PP-HD 
  • Vacuum Chuck 
  • 1 x D-V10-S50-PP-HD 
  • Fragment Adapter

Options

Photolithography
SPIN150x-LNR
Options POLOS
APT
Liners for the SPIN150x
Lid and Bowl Liner
Thickness: 0.5 mm
Consists of 20 sets
Photolithography
37819
Options POLOS
APT
Centering Aid (F-S-SPIN150x)
Photolithography
SHSK
Options POLOS
APT
Syringe Holder Starter Kit
Photolithography
VP-230V
Options POLOS
APT
Vacuum Pump (Oil-less)
Photolithography
29243
Options POLOS
APT
Drain Hose (DEXT-NPP1.5)