Process Refractometer for concentration monitoring 050 1/2" - PFA - PUS (Pillar connect)

INLINE CONCENTRATION MONITOR provides real-time measurement in critical processes of semiconductor wet chemical applications. The instrument integration to process environments and control systems with industrial standard communication protocols is flexible with stand-alone refractometer setups, as well as optional modular connection units and external displays.

Our semiconductor fab chemical monitor is ideal for a variety of applications, including:

• Chemical blend checksum of SC-1 and SC-2
• Hard mask etching with NH3 water mixes
• Silicon wet etch with 50% KOH
• Titanium etch with H2SO4:HNO3:H3PO4 mixes
• Back side poly etch with HF:HNO3 mixtures
• Post-CMP cleans with various mixtures

Our technology is capable of monitoring a wide range of critical semiconductor chemicals, including but not limited to:

• Hydrogen peroxide (H2O2)
• Ammonium hydroxide (NH3 water)
• Dilute hydrofluoric acid (HF)
• Phosphoric acid (H3PO4)
• Hydrochloric acid (HCl)
• Sodium hydroxide (NaOH)
• Sulfuric acid (H2SO4)
• N-methyl pyrrolidone (NMP)
• Tetramethylammonium hydroxide (TMAH)
• Iso-propyl alcohol (IPA)
• Potassium hydroxide (KOH)
• Nitric acid (HNO3)
• Polyethylene glycol (PEG)
• Citric acid (C6H8O7)
• Acetic acid (CH3COOH)