MegPie Transducer (200/300mm) Dual Zone - Sapphire

The Dual Zone MegPie is a single-wafer Megasonic transducer for cleaning and sonochemical
processing of multiple substrate sizes in one chamber. It applies a uniform dose of acoustic energy to a
rotating substrate. The MegPie will improve your process efficiency and lower the process time. It is easy
to retrofit to your single substrate processing tool.

Material: Sapphire
Processes two sizes of substrates: 150 / 200 mm, 200 / 300 mm, or 300 / 450 mm

Features & benefits

• Patented crystal bond to the resonator
• Patented RF connection to the crystal
• Redundant internal RTP temperature monitoring
• Custom sizes available
• Uniform direct acoustic energy applied to the process
• Increased process efficiency
• Reduced process time
• Reduced process chemistry usage
• No moving parts to maintain
• No consumables – works better than brushes 3

Technical specifications

• Power density: 0.05 – 2.0 Watts/cm2
• Standard operating frequency: 925 kHz; other frequencies available on request
• Mounting height: 0.02" – 0.14" (0.5mm – 3.5mm)
• Process fluid temperature: 15°C – 60°C
• Process fluid required depends on the substrate size and RPM: 0.5 – 3.0 lpm
• Operating RPM: 1 – 100
• Nitrogen or CDA purge: 10 lpm
• Mounting with 3 x M6 female threaded bosses
• Use with IMPulse RF electronics

Processes Supported

• Post-CMP
• TSV
• Pre-SOIC bond clean
• SU-8 develop
• Lift off
• Resist strip
• Processes Supported
• LIGA processes
• Mask cleaning
• Etch assist
• Plating pre-cleaning
• Pre-plating bubble removal
• Post-laser cleaning