Prosys Inc.
MegPie Transducer (100/150mm) Dual Zone - Stainless Steel

Prosys Inc.
MegPie Transducer (100/150mm) Dual Zone - Stainless Steel
Brand
Prosys Inc.
Product Number
910-03430-01
Status
Request information
The Dual Zone MegPie is a single-wafer Megasonic transducer for cleaning and sonochemical
processing of multiple substrate sizes in one chamber. It applies a uniform dose of acoustic energy to a
rotating substrate. The MegPie will improve your process efficiency and lower the process time. It is easy
to retrofit to your single substrate processing tool.
Material: Stainless Steel
Processes two sizes of substrates: 150 / 200 mm, 200 / 300 mm, or 300 / 450 mm
Features & benefits
Technical specifications
Processes Supported
processing of multiple substrate sizes in one chamber. It applies a uniform dose of acoustic energy to a
rotating substrate. The MegPie will improve your process efficiency and lower the process time. It is easy
to retrofit to your single substrate processing tool.
Material: Stainless Steel
Processes two sizes of substrates: 150 / 200 mm, 200 / 300 mm, or 300 / 450 mm
Features & benefits
- Patented crystal bond to the resonator
- Patented RF connection to the crystal
- Redundant internal RTP temperature monitoring
- Custom sizes available
- Uniform direct acoustic energy applied to the process
- Increased process efficiency
- Reduced process time
- Reduced process chemistry usage
- No moving parts to maintain
- No consumables – works better than brushes 3
Technical specifications
- Power density: 0.05 – 2.0 Watts/cm2
- Standard operating frequency: 925 kHz; other frequencies available on request
- Mounting height: 0.02" – 0.14" (0.5mm – 3.5mm)
- Process fluid temperature: 15°C – 60°C
- Process fluid required depends on the substrate size and RPM: 0.5 – 3.0 lpm
- Operating RPM: 1 – 100
- Nitrogen or CDA purge: 10 lpm
- Mounting with 3 x M6 female threaded bosses
- Use with IMPulse RF electronics
Processes Supported
- Post-CMP
- TSV
- Pre-SOIC bond clean
- SU-8 develop
- Lift off
- Resist strip
- Processes Supported
- LIGA processes
- Mask cleaning
- Etch assist
- Plating pre-cleaning
- Pre-plating bubble removal
- Post-laser cleaning