K-PRO™ photoresists are advanced packaging positive resists for use in i-line, g-line and broadband packaging applications. They are compatible with plating metals including copper, pure tin, and nickel and offer high sensitivity, high throughput, and excellent process latitude. K-PRO™ positive-tone photoresists are designed to cover varied terrain for advanced wafer level packaging, MEMS, and 3D photolithography applications.
- Cover 5 – 25 µm in a single coat
- Double-coat process available for up to 50 microns
- Designed for use with metal-ion or metal-ion free developers
- No PEB required