4" Mask Aligner and Exposure System - 350W UV Lamp

85 psi ( 6 kg/cm2) , 6mm tube- Vacuum : < -200 mbar ( Vacuum Pump Included )" />

4" Mask Aligner and Exposure System - 350W UV Lamp

Number: MDA-400M
Price on quote


Substrate size
4" (100mm)
System type
Light source
350W UV Lamp


Mask Aligners Brochure 2017


Product description

4" Mask Aligner and Exposure System

Model: MDA-400M

The MDA-400M is designed for research organizations who want to work with a state of the art technology mask aligner.This highly accurate system allows researchers to easily develop their processes on either small substrate pieces or wafers up to 4".

Standard Features:
  • Manual control system
  • Sample size: Up to 4" diameter
  • Mask holder size: Up to 5" x 5"
  • UV lamp: 350W
  • 350W mercury short arc lamp& power supply
  • Dual CCD zoom microscope and 19" LCD monitor
  • Large area stationary alignment tooling module with X, Y, Z and theta motion
  • Wedge error compensation (leveling type)
  • Dimensions: 1000 (W) x 917 (D) x 781 (H) mm
  • Weight: 350 kg
  • Warranty: 1 year