12" Mask Aligner & Exposure System - 2-5 kW UV Lamp

30 mw/ cm2- Max. Beam Size : 14.25" x 14.25"- Beam Uniformity: < 4% (12")2) Top side Microscope Module- Manual Motorized moving stage : Dual X, Y, Z Axis & Touch control- Moving DistanceObjective separation: 100 ~ 300mmY-Axis : ± 20mm- Magnification: 150x ~ 800x- 19" LCD Monitor 3) Stage and Controller Module- Stage Moving Distance: X, Y Axis : ±5mmZ Axis : About 10 mmTheta Axis: ±4 degrees- Stage Resolution:X, Y Stage Resolution: 0.1 µmTheta: 5 x 10-5 degreesZ Axis: 0.1 ~ 100 µm- X,Y,Z and Theta Axis motorized motion - Z-Axis Alignment Gap: 0 ~ 100 µm- Alignment accuracy: 1um4) Resolution- Vacuum Contact: 1.5um- Hard Contact: 2um- Soft contact: 3um- 20um Proximity: 5um 5) Utility requirement - Dimension: 1700mm x 1500mm x 2100mm [WxDxH]- Electric Power: 220Vac / 15A / 1 Phase - N2: More than 4kg/cm2 ( 50 psi ), Flow rate 5 Liter/minOutside diameter 6 mm PU Tube- Air: More than 6kg/cm2 ( 80 psi ), Flow rate 10 Liter/minOutside diameter 6 mm Tube- Vacuum: > 600mmHg, ( Vacuum pump include ) - N2 Consumption- 13~17 Liter/min For Process(Stage: 1 Liter/min, Lamp House: 12~16 Liter/min)- Weight: Equipment: 1,200 kg" />

12" Mask Aligner & Exposure System - 2-5 kW UV Lamp

Number: MDA-12SA
Price on quote
Quantity

Specifications

Number
MDA-12SA
Substrate size
12" (450mm)
System type
Semi Automatic
Light source
2-5 kW UV Lamp
Brand

Documentation

Mask Aligners Brochure 2017

Reviews

Product description

12" Mask Aligner & Exposure System

Model: MDA-12SA

The MDA-12FA represents the next generation of Full-Field lithography systems. This model offers a semi-autotomic mask aligner platform with a higher overlay accuracy and more reliable operation the conventional systems. It is great for Ceramic, Probe Card and WLP applications. The MDA-12FA has a higher production and user friendly controls.

Specifications:
  • Type: Joystick control Semi-Auto (Mask Aligner)
  • Mask size: up to 13" x 13"
  • Substrate size: piece to 12" x 12"
  • UV lamp & Power: 2kW & power supply 5kW & Power supply
  • Uniform beam size: 13.25" x 13.25"
  • Beam Uniformity: <±5%
  • Beam wavelength: 350 ~ 450nm
  • 365nm Intensity: 15 ~ 20mW/cm2 (2kW) 25 ~ 60mW/cm2 (5kW)
  • Alignment accuracy: 1um
  • Process resolution: 1um@1um PR thickness with vacuum contact
  • Process mode: Soft, Hard, Vacuum contact & Proximity
  • Substrate chuck moving: X ,Y, Z & (theta) (Motorized)
  • Frame: Anti-Vibration system