Photogile TMPOU Filter for Lithography Process

Photoresist solvent & developer filters

 

            PALL & ENTEGRIS COMPATIBLE    VERY COMPETATIVE PRICING   SHORT DELIVERY TIMES             

Available as cartridge and capsule, with custom filter media for your process. These filters prevent microbubble voids, metallic contamination, particle contamination and gel microbridge defects.

Benefits

  One-piece construction is easy to install, clean and replace this filter capsule
  Unique vent structure effectively removes bubbles in the photoresist
  Available in a wide range of membranes to meet all customer requirements
  Strict Japanese quality assurance ensures product stability

    Product Specification

     Filter membrane       
     Cage/Core/End Caps      
     Max. Operating Temperature     

 

UPE / Nylon / Multi / HAPES / PTFE
HDPE
50°C