Photogile TMPOU Filter for Lithography Process
Photoresist solvent & developer filters

✔ PALL & ENTEGRIS COMPATIBLE ✔ VERY COMPETATIVE PRICING ✔ SHORT DELIVERY TIMES
Available as cartridge and capsule, with custom filter media for your process. These filters prevent microbubble voids, metallic contamination, particle contamination and gel microbridge defects.
Benefits
• One-piece construction is easy to install, clean and replace this filter capsule
• One-piece construction is easy to install, clean and replace this filter capsule
• Unique vent structure effectively removes bubbles in the photoresist
• Available in a wide range of membranes to meet all customer requirements
• Strict Japanese quality assurance ensures product stability
Product Specification
Filter membrane
Cage/Core/End Caps
Max. Operating Temperature
UPE / Nylon / Multi / HAPES / PTFE
HDPE
50°C