Atomic Layer Deposition - AT400
Looking for affordable Atomic Layer Deposition ALD?
R&D table top ALD system for growing conformal thin films
at smaller scales at reasonable cost.

✔ Up to 5 lines ✔ Table Top ALD system ✔ Free ALD Application Examples
Our table top atomic layer deposition system is a small-scale ALD system, that offers a fast cycle capability of 6-10 cycles/min, e.g. up to 1.2nm/min Al2O3 (best in class). Top Tech University Support
Our ALD features
- Fast cycling capability 6-10 cycles per minute
- Up to 5 ALD precursor sources at one time
- Small footprint
Conceived by Dr. Phillipe de Rouffignac, the Harvard Center for Nanoscale Science’s (CNS) Principal Scientist in charge of thin film deposition
ALD Method: A wide range of accessible materials
Pre-programmed proven
process recipes for many materials such as Al2O3, Pt, Ru, HfO2, TiO2, ZrO2, ZnO, AZO (Al:ZnO), TiN…
Excellent process development support
Harvard lab scientists provide evidence based assistance to customers. Top Tech University Support
ALD Application: Fast cycling capability
Streamlined chamber design and small chamber volume allow 6-10 cycles/min, e.g. up to 1.2nm/min Al2O3 (best in class).